• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The generator (100) has an alternating current (AC) voltage source (101) for supplying voltage to a Cockroft-Walton-generator (104). An amplitude regulator (102) adjusts the AC voltage source. A step-up transformer (103) is connected with the AC voltage source. A filter section (105) is provided for smoothing high voltage produced by the Cockroft-Walton- generator. An amplifier (112) is connected with a capacitive power splitter (110) for receiving detected variations of the smoothed high voltage. A controllable voltage supply (113) is connected with the amplifier. An independent claim is also included for a method for production of stable high voltage by a high-voltage direct current generator.
    公开号:NL1037778A
    申请号:NL1037778
    申请日:2010-03-05
    公开日:2010-09-08
    发明作者:Joerg Fober
    申请人:Zeiss Carl Nts Gmbh；
    IPC主号:
    专利说明:

    Title: Device and method for generating a stable high voltage.
    DESCRIPTION
    The invention relates to a device for generating a stable highvoltage, namely a high-voltage DC generator for a particle beam apparatus. Theinvention also relates to a method for generating a stable high voltage for a particlebeam apparatus.
    A generator is to be understood above and also hereafter as adevice which is capable of adjusting a voltage (such as a high voltage) by a specificvalue. The generator may simultaneously also be implemented as a voltage source(for example, as a high-voltage source). In other words, in this case the generatorprovides both the voltage (such as the high voltage) and also a possibility ofadjusting this voltage by a specific value.
    Particle beam apparatuses, such as electron beam apparatuses,have been used for some time for studying samples. In particular, scanning electronmicroscopes and transmission electron microscopes are known.
    In a transmission electron microscope, electrons of an electronbeam, which are generated using a beam generator, are directed onto a sample tobe studied. A part of the electrons of the electron beam is scattered in the sample.Non-scattered electrons and the scattered electrons are detected and used either togenerate images of the sample or to generate diffraction images of the sample.
    Scanning electron microscopes are used to study surfaces ofobjects (samples). For this purpose, in a scanning electron microscope, an electronbeam (also referred to hereafter as a primary electron beam) is generated using abeam generator and focused by an objective lens onto an object to be studied. Theprimary electron beam is scanned over the surface of the object to be studied usinga deflection apparatus. The electrons of the primary electron beam interact with theobject. As a result of the interaction, electrons are emitted from the object inparticular (so-called secondary electrons) or electrons of the primary electron beamare backscattered (so-called backscattered electrons). The backscattered electronshave an energy in the range of 50 eV up to the energy of the electrons of the primaryelectron beam at the object, while the secondary electrons have an energy of lessthan 50 eV. Secondary and backscattered electrons form the subsequent so-calledsecondary beam and are detected using a detector. The detector signal thus generated is used for image generation.
    In both previously described particle beam apparatuses, theelectrons of the primary electron beam are accelerated to a specific energy. For thispurpose, the beam generator is kept at a high voltage, for example, in the range of0.02 kV to 30 kV for a scanning electron microscope and 20 kV to 200 kV for atransmission electron microscope. In order to achieve a desired resolution, settingthe high voltage to a specific value is known. Furthermore, in order to achieve agood resolution in the final images provided by the particle beam apparatuses, it isdesirable to keep the voltage applied to the beam generator as stable as possible.
    A high-voltage DC generator for a particle beam apparatus is knownfrom the prior art which has an AC voltage source, which is set by an amplituderegulator via a desired target value of the high voltage and whose output voltage issupplied to a step-up transformer. The step-up transformer steps up the AC voltage.The output voltage of the step-up transformer is in turn supplied to aCockroft-Walton generator, which multiplies the output voltage of the step-uptransformer. The high voltage resulting in this way is smoothed via a filter or multiplefilters made of resistors and capacitors. The high voltage smoothed in this way issupplied via a measuring resistor to the amplitude regulator. Fluctuations of thesmoothed high voltage are detected via a capacitive divider, which includes a firstcapacitor and a second capacitor, and supplied to an amplifier. The amplifierprovides an output signal, which is supplied to the amplitude regulator and acts incounterphase to the fluctuations of the smoothed high voltage. In this way, thefluctuations of the smoothed high voltage are additionally damped. The prior artdescribed here has the disadvantage that the amplitude regulator tends towardoscillations. Considerations have shown that limits are thus set on the stabilizationof the high voltage. Therefore, not every gain is possible and the maximumachievable stability of the high voltage is thus narrowly limited.
    Reference is made, for example, to DE 44 33 531 A1 and DE 44 33524 A1 in regard to the prior art.
    The invention is therefore based on the object of disclosing a deviceand a method, using which basically any desired high voltage may be stabilized.
    This object is achieved according to the invention by a high-voltageDC generator having the features of Claim 1. A method according to the invention isgiven by the features of Claim 11. Further features of the invention result from the following description, the appended claims, and/or the appended figures.
    A high-voltage DC generator for a particle beam apparatus, inparticular an electron microscope, is provided according to the invention. Thehigh-voltage DC generator has at least one Cockroft-Walton generator, at least oneAC voltage source for supplying the Cockroft-Walton generator, and at least oneamplitude regulator for setting the AC voltage source. Furthermore, at least onestep-up transformer is provided, which is connected to the AC voltage source forsupplying the step-up transformer with an output voltage of the AC voltage source.The high-voltage DC generator according to the invention is additionally providedwith at least one filter for smoothing a high voltage generated by theCockroft-Walton generator, with at least one measuring resistor for supplying thehigh voltage smoothed by the filter to the amplitude regulator, with at least onecapacitive divider for detecting fluctuations of the smoothed high voltage, and withat least one amplifier, which is connected to the capacitive divider to receive thedetected fluctuations of the smoothed high voltage. In addition, a controllablevoltage source, which is connected to the amplifier, is situated on the high-voltageDC generator according to the invention.
    The high-voltage DC generator according to the invention ensuresthat fluctuations of the smoothed high voltages are detected by the capacitivedivider and supplied to the amplifier. The amplifier controls the controllable voltagesource in counterphase in the invention. The voltage of the controllable voltagesource is superimposed on the smoothed high voltage. The sum of the voltage ofthe controllable voltage source and the smoothed high voltage forms the generatedand stable high voltage which is supplied to the particle beam apparatus.
    It is advantageous that, on the one hand, effective damping ofinterfering fluctuations of the smoothed high voltage is achieved. On the other hand,it is advantageous that the dynamics of the stabilization are not limited by thebandwidth of the amplitude regulator. Even higher-frequency interference may thusbe effectively suppressed. Any desired high voltage may basically be stabilized onthe basis of the invention.
    In a first embodiment of the high-voltage DC generator according tothe invention, at least one current measuring unit is provided for detecting ahigh-voltage load current, the step-up transformer being connected to the currentmeasuring unit.
    In a further embodiment of the high-voltage DC generator accordingto the invention, an output-side reference point of the controllable voltage source isthe ground potential. Alternatively or additionally, the capacitive divider is designedin such a way that the fluctuations of the smoothed high voltage are detected inrelation to the ground potential.
    In still a further embodiment of the high-voltage DC generatoraccording to the invention, the capacitive divider is designed in such a way that thefluctuations of the smoothed high voltage are detected in relation to a virtual ground.For example, a reference signal close to the ground potential is provided as thevirtual ground, which represents 0 V for the amplifier. The fluctuations of thesmoothed high voltage thus detected are then supplied to the amplifier. Theamplifier in turn controls, in counterphase, the controllable voltage source whoseoutput-side reference point is the ground potential. In the previously describedembodiment, the fluctuations of the smoothed high voltage are damped sufficientlywell. In addition, the fluctuations do not "disappear" through the feedback of thesmoothed high voltage. Only the sum which is formed by the fluctuations and thesmoothed high voltage is practically zero. The total gain of amplifier and thecontrollable voltage source is calculated in this embodiment from the negativedivider ratio of a second capacitor and a first capacitor, which form the capacitivedivider. The product of the divider ratio and the total gain is thus precisely -1.
    In a further embodiment of the high-voltage DC generator accordingto the invention, the amplitude regulator is satiable using a target value for a desiredhigh voltage. On the one hand, an embodiment is provided in which the amplituderegulator is exclusively satiable using the target value for a desired high voltage. Onthe other hand, however, an embodiment is also provided in which the amplituderegulator is additionally satiable via a further value. For example, the amplituderegulator is additionally satiable using a target value for a change value of the highvoltage. The change value is the value by which the high voltage is to be changed.
    In still a further embodiment of the high-voltage DC generatoraccording to the invention, a superposition voltage source is provided forsuperimposing the smoothed high voltage. For example, the superposition voltagesource is implemented as a voltage source which allows the change in the highvoltage by a specific value. For example, the superposition voltage source isconnected between the capacitive divider and a tap of the smoothed high voltage.
    Alternatively thereto, the superposition voltage source is connected between thecontrollable voltage source and the ground potential. The use of a superpositionvoltage source is advantageous. The high voltage provided to a particle beamapparatus is composed in these exemplary embodiments of the sum of the stabilizedsmoothed high voltage and the voltage of the superposition voltage source. Becausein the previously described exemplary embodiments a signal is always tappedup-stream from the superposition voltage source for the stabilization of thesmoothed high voltage, a change in the voltage of the superposition voltage sourceis not detected and is thus not suppressed by the stabilization of the high voltage.
    The invention also relates to a method for generating a stable highvoltage using a high-voltage DC generator, which has at least one of theabove-mentioned features or a combination of the above-mentioned features. In themethod, it is provided that the amplifier controls the controllable voltage source incounterphase and the stable high voltage is formed by the sum of the smoothed highvoltage and the voltage provided by the controllable voltage source. In a furthermethod, the stable high voltage is formed with the help of the superposition voltagesource by the sum of the stable smoothed high voltage and a voltage of thesuperposition voltage source.
    The invention is explained in greater detail hereafter on the basis ofexemplary embodiments using figures.
    Figure 1 shows a schematic view of a particle beam apparatus inthe form of a transmission electron microscope;
    Figure 2 shows a schematic view of a particle beam apparatus inthe form of a scanning electron microscope;
    Figure 3 shows a schematic view of a first embodiment of ahigh-voltage DC generator;
    Figure 4 shows a schematic view of a second embodiment of ahigh-voltage DC generator;
    Figure 4A shows a schematic view of the second embodiment of ahigh-voltage DC generator having a virtual ground;
    Figure 5 shows a schematic view of a third embodiment of ahigh-voltage DC generator;
    Figure 6 shows a schematic view of a fourth embodiment of ahigh-voltage DC generator;
    Figure 6A shows a schematic view of the fourth embodiment of ahigh-voltage DC generator having a virtual ground;
    Figure 7 shows a schematic view of a fifth embodiment of ahigh-voltage DC generator, and
    Figure 7A shows a schematic view of the fifth embodiment of ahigh-voltage DC generator having a virtual ground.
    The invention is described hereafter on the basis of a particle beamapparatus in the form of a transmission electron microscope (always designatedTEM hereafter) and a scanning electron microscope (always designated SEMhereafter). However, it has already been indicated that the invention is not restrictedto a TEM or an SEM. Rather, the invention is usable in any particle beam apparatus,for example, also in an ion beam apparatus.
    Figure 1 shows a schematic view of a TEM. The TEM has anelectron source 1 in the form of a thermal field emission source. However, anotherelectron source is, of course, also usable. An extraction electrode 2, whose potentialextracts electrons from electron source 1, is situated along the optical axis OA of theTEM downstream from electron source 1. Furthermore, a first electrode 3 forfocusing the source location and a second electrode 4 for accelerating the electronsare provided. Because of second electrode 4, the electrons exiting from electronsource 1 are accelerated to a desired and satiable energy using an electrodevoltage. For this purpose, electron source 1 is connected to a high-voltage DCgenerator 100, which is explained in greater detail below.
    A multistage condensor, which has three magnetic lenses 5 through7 (namely a first magnetic lens 5, a second magnetic lens 6, and a third magneticlens 7), which is adjoined by an objective lens 8, which is provided in the form of amagnetic lens, is situated on the further course of optical axis OA. An object plane 9is situated at objective lens 8, on which a sample to be studied may be situatedusing a sample manipulator. The illuminated field of object plane 9 is satiable inparticular by appropriate setting of the operating parameters (such as a lenscurrent) of first magnetic lens 5, second magnetic lens 6, third magnetic lens 7, andobjective lens 8.
    A diffraction lens 15, which is implemented as a magnetic lens, issituated downstream from objective lens 8 in the direction opposite electron source1. Diffraction lens 15 images a rear focal plane 10 of objective lens 8 in a diffraction intermediate image plane 21. Furthermore, objective lens 8 generates a realintermediate image 14 of object plane 9. Diffraction lens 15 images intermediateimage 14 of object plane 9 in input image plane 17 of a projective system whichincludes a first projective lens 18 and a second projective lens 19. Projective system18, 19 generates an image on a detector 20 of the sample which is situated in objectplane 9 and imaged in input image plane 17 of projective system 18, 19. Throughappropriate changeover of projective system 18, 19, it is also possible to image rearfocal plane 10 or diffraction intermediate image plane 21 on detector 20 (or in a finalimage plane). A TEM of this type may have further lenses and deflection andcorrection systems (such as stigmators or correctors) and/or spectrometers.
    Figure 2 shows a further particle beam apparatus in the form of anSEM, on which the invention is implemented. The particle beam apparatus has anelectron beam column 22, which is provided with an optical axis 23, a beamgenerator in the form of an electron source 24 (cathode), an extraction electrode 25,and an anode 26, which simultaneously forms one end of a beam guiding tube 27.For example, electron source 24 is a thermal field emitter. Electrons which areemitted from electron source 24 are accelerated to anode potential because of apotential difference between electron source 24 and anode 26. A particle beam inthe form of an electron beam is accordingly provided. Electron source 24 is alsoconnected to a high-voltage DC generator 100, which will be explained in greaterdetail below, in this exemplary embodiment.
    Furthermore, an objective lens 28 is provided, which has a holethrough which beam guiding tube 27 passes. Objective lens 28 also has pole shoes29, in which coils 30 are situated. An electrostatic deceleration apparatus isconnected downstream from beam guiding tube 27. It includes a single electrode 31and a tubular electrode 32. Tubular electrode 32 is at the end of beam guiding tube27 opposite a support element 33. Support element 33 is used to receive an objectto be studied.
    Tubular electrode 32 is at anode potential together with beamguiding tube 27, while single electrode 31 and a sample situated on support element33 are at a lower potential than the anode potential. In this way, the electrons of theparticle beam may be decelerated to a desired energy, which is required for thestudy of a sample situated on support element 33. Electron beam column 22 alsohas scanning means 34, using which the electron beam may be deflected and scanned over a sample situated on support element 33.
    For the imaging, secondary electrons and/or backscatteredelectrons, which arise because of the interaction of the electron beam with a samplesituated on support element 33, are detected using a detector 35 situated in beamguiding tube 27. The signals generated by detector 35 are transmitted for imaging toan electronics unit (not shown).
    Figure 3 shows a first exemplary embodiment of high-voltage DCgenerator 100, which is used, for example, in one of the two previously describedparticle beam apparatuses. High-voltage DC generator 100 has an AC voltagesource 101, which is set by an amplitude regulator 102 via a target value S. Targetvalue S is the high voltage to be achieved, which is to be supplied to the particlebeam apparatus. The output voltage of AC voltage source 101 is supplied to astep-up transformer 103, which steps up the supplied output voltage of AC voltagesource 101. A Cockcroft-Walton generator 104, which multiplies the transformedvoltage supplied thereto, is connected downstream from step-up transformer 103.The high voltage resulting in this way is smoothed via a filter, which has a filterresistor 105 and a filter capacitor 106. In further embodiments, multiple filters mayalso be provided, which include filter resistors 105 and filter capacitors 106. Thesmoothed high voltage is supplied via a measuring resistor 108 to amplituderegulator 102. Fluctuations of the smoothed high voltage are detected via acapacitive divider including a first capacitor 110 and a second capacitor 111 andsupplied to an amplifier 112. Amplifier 112 provides an output signal, which isapplied to a controllable high-voltage source 113. A load current meter 109, whichdetects a high-voltage load current, is situated between controllable high-voltagesource 113 and step-up transformer 103.
    It is desirable to keep the frequency bandwidth of the suppressedfluctuations as large as possible. By appropriate implementation of filter resistor 105and filter capacitor 106 (or by implementation of the filter resistors and filtercapacitors in exemplary embodiments having more than one filter resistor and morethan one filter capacitor), it is possible to suppress higher-frequency components ofthe fluctuations. In regard to the lower-frequency components of the fluctuations tobe suppressed, it must be ensured that lower frequencies are always suppressed toa lesser degree by the lowpass filter, which is formed by filter resistor 105 and filtercapacitor 106, and reach tap 107 of the high voltage.
    For this reason, the fluctuations to be suppressed are to bedetected by a capacitive divider. First capacitor 110 is implemented as high-voltageresistant. Second capacitor 111 has a significantly higher capacitance than firstcapacitor 110, at correspondingly lower voltage load. The lower limiting frequency,which determines a lower limit of the frequency bandwidth, is reduced due to thehigher capacitance of second capacitor 111, so that with a correspondingimplementation of second capacitor 111, slow changes (fluctuations) of the highvoltage may also be detected by amplifier 112 and suppressed.
    It is known that high-voltage resistant capacitors have rather largedimensions and are very costly, even for small capacitances. For this reason, it isadvantageous in particular in the invention that through the use of the previouslydescribed capacitive divider, in addition to the input resistor of amplifier 112, secondcapacitor 111 (basically a low-voltage capacitor) is primarily used for thedetermination of the lower limiting frequency of the frequency bandwidth. Anamplitude of the fluctuation, which decreases linearly as the divider ratio of thecapacitance of second capacitor 111 to the capacitance of first capacitor 110increases, may be compensated for by a higher gain of amplifier 112.
    High-voltage DC generator 100 ensures that fluctuations of thesmoothed high voltage are detected by capacitive divider 110, 111 and supplied toamplifier 112. Amplifier 112 controls controllable voltage source 113 incounterphase. The voltage of controllable voltage source 113 is supplied to thesmoothed high voltage. The sum thus formed of the voltage of controllable voltagesource 113 and the smoothed high voltage forms the generated and stabilized highvoltage, which is supplied to the particle beam apparatus via a tap 107. It isadvantageous for this purpose that, on the one hand, effective damping ofinterfering fluctuations of the smoothed high voltage is achieved. On the other hand,it is advantageous in that the dynamics of the stabilization are not limited by thebandwidth of amplitude regulator 102. Therefore, even higher-frequencyinterference may be effectively suppressed. Basically, any desired high voltage maybe stabilized using the described device and the described method.
    Figure 4 shows a further embodiment of high-voltage DC generator100. Identical components are provided with identical reference numerals as inFigure 3. The exemplary embodiment according to Figure 4 substantiallycorresponds to the exemplary embodiment according to Figure 3. In contrast to the exemplary embodiment according to Figure 3, capacitive divider 110, 111 of the exemplary embodiment according to Figure 4 is designed in such a way that the fluctuations of the smoothed high voltage are detected in relation to a virtual ground.For example, an internal apparatus reference signal is provided as the virtualground, which is designated by 0 V, i.e., the regulator reference point. Thereference point of the signal of target value S is also the virtual ground designatedby 0 V in this case. This is illustrated once again in Figure 4A. The exemplaryembodiment of Figure 4A corresponds to the exemplary embodiment of Figure 4, thereference point being shown in Figure 4A. The fluctuations detected in relation tothis virtual ground are supplied to amplifier 112. The amplifier in turn controlscontrollable voltage source 113, whose output-side reference point is the groundpotential, in counterphase. In the previously described embodiment, the fluctuationsof the smoothed high voltage are damped sufficiently well. In addition, the suppressed fluctuations of the stabilized high voltage may still be detected in their entirety by the capacitive divider.
    The sum of the fluctuations of the high-voltage source in relation tothe virtual ground and the fluctuation of controllable voltage source 113 in relation toground become practically zero. Because the sum of these two voltage sourcesrepresents the used voltage, it is thus stabilized. A more precise value of the totalgain, which is formed from the product of the gains by amplifier 112 and controllablevoltage source 113, is calculated for the optimum damping of the fluctuations. Thisis equal to the negative divider ratio of second capacitor 111 and first capacitor 110.The product of the divider ratio and the total gain is thus precisely -1.
    Figure 5 shows a further embodiment of high-voltage DC generator100. Identical components are again provided with identical reference numerals.The exemplary embodiment according to Figure 5 basically corresponds to theexemplary embodiment according to Figure 3. In contrast to the exemplaryembodiment according to Figure 3, amplitude regulator 102 is not only controlled bytarget value S of the desired high voltage, but rather also using a target value DE fora value, by which the desired high voltage is to be changed. The signals for targetvalue S and for target value DE are added. The above-mentioned embodiment hasall the advantages of the invention; however, it is not suitable for all forms of use.This is because a desired change DE is also considered here in the stabilization asan undesired fluctuation. It is therefore initially suppressed. A desired value of the high voltage is therefore only achieved after a relatively long time.
    The described disadvantages in regard to the embodiment of Figure5 are avoided by the exemplary embodiment according to Figure 6 and theexemplary embodiment according to Figure 7. Identical components are againprovided with identical reference numerals. In contrast to the exemplaryembodiment according to Figure 5, in the exemplary embodiment according toFigure 6, a superposition voltage source in the form of a voltage source 114 forsuperimposing the smoothed high voltage is to be used. Voltage source 114specifies value DE, by which the high voltage is to be changed. Voltage source 114is connected between capacitive divider 110, 111 and tap 107 of the stabilized highvoltage. Figure 7 shows an alternative configuration of voltage source 114, namelybetween controllable voltage source 113 and the ground potential. The use of theabove-mentioned superposition voltage source is advantageous. The high voltageprovided to a particle beam apparatus is composed in these exemplaryembodiments of the sum of the smoothed high voltage and the voltage of voltagesource 114. Because a signal for the stabilization for the smoothed high voltage isalways tapped upstream from voltage source 114 in the previously describedexemplary embodiments, a change in the voltage of voltage source 114 is notdetected and is thus not suppressed upon the stabilization.
    For the sake of completeness, it is to be noted that the use of aseparate voltage source for desired changes (DE) of the high voltage is alsoadvisable in stabilized high voltage generators having virtual ground. Exemplaryembodiments which take this into account are shown in Figures 6A and 7A. Theexemplary embodiment of Figure 6A is based on the exemplary embodiment ofFigure 6. Identical components are provided with identical reference numerals. Theexemplary embodiment of Figure 7A is based on the exemplary embodiment ofFigure 7. Also here, identical components are provided with identical referencenumerals.
    For the sake of good order, it is to be noted that in furtherexemplary embodiments (not shown, however), in the TEM according to Figure 1high-voltage DC generator 100 is connected to extraction electrode 2, first electrode3 and second electrode 4, each via further control units. In a still further exemplaryembodiment, in the SEM according to Figure 2, extraction electrode 25, anode 26,and beam guiding tube 27 are also connected each via further control units to high-voltage DC generator 100. The potentials of the above-mentioned units whichare connected to high-voltage DC generator 100 thus depend on the high voltage attap 107 of the high voltage.
    List of reference numerals 1 electron source 2 extraction electrode 3 first electrode 4 second electrode 5 first magnetic lens 6 second magnetic lens 7 third magnetic lens 8 objective lens 9 objective plane 10 rear focal plane 1112 13 14 real intermediate image 15 diffraction lens 16 17 input image plane for projective lenses 18 first projective lens 19 second projective lens 20 detector/final image plane 21 diffraction intermediate image plane 22 electron beam column 23 optical axis 24 electron source 25 extraction electrode 26 anode 27 beam guiding tube 28 objective lens 29 pole shoes 30 coils 31 single electrode 32 tubular electrode 33 support element 34 scanning means 35 detector 100 high-voltage DC generator 101 AC voltage source 102 amplitude regulator 103 step-up transformer 104 Cockroft-Walton generator 105 filter resistor 106 filter capacitor 107 tap of high voltage 108 measuring resistor 109 load current meter 110 first capacitor 111 second capacitor 112 amplifier 113 controllable voltage source 114 voltage source OA optical axis
    权利要求:
    Claims (12)
    [1]
    A high-voltage direct current generator (100) for a particle beam device, in particular an electron microscope, with - at least one Cockroft-Walton generator (104), - at least one alternating voltage source (101) for supplying the Cockroft-Walton generator ( 104), - at least one amplitude regulator (102) for adjusting the alternating voltage source (101), - at least one boost transformer (103), which is connected to the alternating voltage source (101) for connecting to an output voltage of the alternating voltage source (101) feeding the booster transformer (103), - at least one filter element (105, 106) for smoothing a high voltage generated by the Cockroft-Walton generator (104), - at least one measuring resistor (108) for the damplifier regulator (102) supplying the high voltage smoothed by the filter element (105, 106), - at least one capacitive divider (110, 111) for detecting fluctuations of the smoothed high voltage, - t and at least one amplifier (112) connected to the capacitive divider (110, 111) to receive the detected fluctuations of the smoothed high voltage, in which a controllable voltage source (113) is provided, which is connected to the amplifier (112).
    [2]
    The high-voltage direct-current generator (100) according to claim 1, wherein at least one current meter (109) is provided for detecting a high-voltage load current, the boosting transformer (103) being connected to the current meter (109).
    [3]
    The high-voltage direct current generator (100) according to claim 1 or 2, wherein a reference point on the output side of the controllable voltage source (113) is the ground potential.
    [4]
    The high-voltage direct current generator (100) according to any of the preceding claims, wherein the capacitive divider (110, 111) is designed so that the fluctuations of the smoothed high voltage with respect to the mass potential are detected.
    [5]
    High-voltage direct current generator (100) according to one of claims 1 to 3, wherein the capacitance divider (110, 111) is designed such that the fluctuations of smoothed high voltage with respect to a virtual mass are detected.
    [6]
    The high voltage direct current generator (100) according to any of the preceding claims, wherein the amplitude regulator (102) is saturable using a target value (S) for a desired high voltage.
    [7]
    The high voltage direct current generator (100) according to any of the preceding claims, wherein the amplitude regulator (102) is saturable using a target value (DE) of a high voltage change value.
    [8]
    A high voltage direct current generator (100) according to any of claims 1 to 6, wherein a superposition voltage source (114) is provided for superimposing on the smoothed high voltage.
    [9]
    The high voltage direct current generator (100) according to claim 8, wherein the superposition voltage source (114) is connected between the capacitive divider (110, 111) and a tap (107) of the smoothed high voltage.
    [10]
    The high voltage direct current generator (100) according to claim 8, wherein the superposition voltage source (114) between the controllable voltage source (113) and the ground potential. is connected.
    [11]
    A method for generating a stable high voltage using a high voltage direct current generator (100) according to any of the preceding claims, wherein - the amplifier (112) controls the controllable voltage source (113) in reverse phase, and - the stable high voltage is formed by the sum of the smoothed high voltage and the voltage provided by the controllable voltage source (113).
    [12]
    The method of claim 11, wherein the stable high voltage is formed using the superposition voltage source (114) by the stable flattened high voltage and a voltage from the superposition voltage source (114).
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    同族专利:
    公开号 | 公开日
    US20100296320A1|2010-11-25|
    NL1037778C2|2012-04-11|
    US8390152B2|2013-03-05|
    DE102010002617A1|2010-09-09|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    DE4433524A1|1994-09-20|1996-03-21|Jeol Ltd|High voltage direct current generator for generating voltage for accelerating charged particles, e.g. in electron microscope,|
    DE4433531A1|1994-09-20|1996-03-21|Jeol Ltd|High voltage d.c. current generator for generating voltage for accelerating charged particles, e.g. in electron microscope,|
    JP2008125325A|2006-11-15|2008-05-29|Jeol Ltd|Dc high-voltage generator|
    GB1226965A|1967-08-17|1971-03-31|DE102010056337A1|2010-12-27|2012-06-28|Carl Zeiss Nts Gmbh|Particle beam system for recording of energy loss spectrum, has high voltage source for providing high voltage between two high voltage outputs and control signal|
    US8610411B2|2011-01-27|2013-12-17|Apple Inc.|High-voltage regulated power supply|
    DE102011077635A1|2011-06-16|2012-12-20|Carl Zeiss Nts Gmbh|High voltage power supply unit for a particle beam device|
    法律状态:
    2019-11-06| MM| Lapsed because of non-payment of the annual fee|Effective date: 20190401 |
    优先权:
    申请号 | 申请日 | 专利标题
    DE102009011511|2009-03-06|
    DE102009011511|2009-03-06|
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